A Physically-Based Model of Vertical TFET--Part II: Drain Current Model

dc.contributor.authorCheng, Qi
dc.contributor.authorKhandelwal, Sourabh
dc.contributor.authorZeng, Yuping
dc.date.accessioned2022-03-28T14:41:39Z
dc.date.available2022-03-28T14:41:39Z
dc.date.issued2022-02-08
dc.descriptionCopyright 2022 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. This article was originally published in IEEE Transactions on Electron Devices. The version of record is available at: https://doi.org/10.1109/TED.2022.3146091.en_US
dc.description.abstractA physically based model for the tunneling current of vertical tunneling field transistors (TFET) is proposed. In part I, the expression of φ1D(x,) is derived from the multi-branch general solutions of Poisson's equation. The model's results are verified with TCAD simulation for transistors with different materials, device geometries, and biases. In this article, a surface potential model is validated at different device regions which include channel and drain. Based on the above two electric potential models, Kane's tunneling formula is utilized for the calculation of band-to-band tunneling current. The proposed current model is valid for all transistors' operating regions. The quantum effect on the band-structure parameters is taken into account in the modeling of InAs vertical TFET. It is shown that the channel thickness needs to be optimized to achieve the highest drive current.en_US
dc.description.sponsorshipThis work was supported in part by NASA International Space Station under Grant 80NSSC20M0142 and in part by Air Force Office of Scientific Research under Grant FA9550-19-1-0297 and Grant FA9550-21-1-0076.en_US
dc.identifier.citationQ. Cheng, S. Khandelwal and Y. Zeng, "A Physically-Based Model of Vertical TFET--Part II: Drain Current Model," in IEEE Transactions on Electron Devices, doi: 10.1109/TED.2022.3146091.en_US
dc.identifier.issn1557-9646
dc.identifier.urihttps://udspace.udel.edu/handle/19716/30711
dc.language.isoen_USen_US
dc.publisherIEEE Transactions on Electron Devicesen_US
dc.subjectBand-to-band tunnelingen_US
dc.subjectcompact modelen_US
dc.subjectline tunnelingen_US
dc.subjecttunneling FETen_US
dc.titleA Physically-Based Model of Vertical TFET--Part II: Drain Current Modelen_US
dc.typeArticleen_US

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