Power guidelines for process monitoring
Author(s) | Davis, Darwin J. | |
Author(s) | Lucas, James M. | |
Author(s) | Saniga, Erwin M. | |
Author(s) | Saccucci, Michael S. | |
Date Accessioned | 2022-08-30T18:55:36Z | |
Date Available | 2022-08-30T18:55:36Z | |
Publication Date | 2022-08-01 | |
Description | This is an Accepted Manuscript of an article published by Taylor & Francis in Quality Engineering on 08/01/2022, available at: http://www.tandfonline.com/10.1080/08982112.2022.2098763. This article will be embargoed until 08/01/2023. | en_US |
Abstract | We present a process for designing monitoring procedures that includes practical power guidelines. These guidelines are based upon the average run length (ARL). The specific guideline metric is the ratio of the in-control ARL (ARLic) to the out-of-control ARL (ARLoc). Our recommended design process uses that ARL Ratio, in combination with the ARLic, ARLoc, and ARL curve, to design effective process monitoring procedures. For adequate power, we generally recommend an ARL Ratio of 20 or more and argue that monitoring procedures with ARL Ratios less than 10 should usually be avoided. An area of caution lies between ARL Ratios of 10 and 20, allowing us to propose a stoplight type model for use in monitoring procedure design. We also discuss exceptions to these guidelines as well as a methodology to incorporate power considerations in other approaches to control chart design. | en_US |
Citation | Darwin J. Davis, James M. Lucas, Erwin M. Saniga & Michael S. Saccucci (2022) Power guidelines for process monitoring, Quality Engineering, DOI: 10.1080/08982112.2022.2098763 | en_US |
ISSN | 1532-4222 | |
URL | https://udspace.udel.edu/handle/19716/31274 | |
Language | en_US | en_US |
Publisher | Quality Engineering | en_US |
Keywords | average run length (ARL) | en_US |
Keywords | CUSUM control chart | en_US |
Keywords | power | en_US |
Keywords | process monitoring Shewhart control chart | en_US |
Title | Power guidelines for process monitoring | en_US |
Type | Article | en_US |
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