Browsing by Author "Hauschild, D."
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Item Efficient passivation of n-type and p-type silicon surface defects by hydrogen sulfide gas reaction(Journal of Physics: Condensed Matter, 2021-09-03) Das, U. K.; Theisen, R.; Hua, A.; Upadhyaya, A.; Lam, I.; Mouri, T. K.; Jiang, N.; Hauschild, D.; Weinhardt, L.; Yang, W.; Rohatgi, A.; Heske, C.An efficient surface defect passivation is observed by reacting clean Si in a dilute hydrogen sulfide–argon gas mixture (<5% H2S in Ar) for both n-type and p-type Si wafers with planar and textured surfaces. Surface recombination velocities of 1.5 and 8 cm s−1 are achieved on n-type and p-type Si wafers, respectively, at an optimum reaction temperature of 550 °C that are comparable to the best surface passivation quality used in high efficiency Si solar cells. Surface chemical analysis using x-ray photoelectron spectroscopy shows that sulfur is primarily bonded in a sulfide environment, and synchrotron-based soft x-ray emission spectroscopy of the adsorbed sulfur atoms suggests the formation of S–Si bonds. The sulfur surface passivation layer is unstable in air, attributed to surface oxide formation and a simultaneous decrease of sulfide bonds. However, the passivation can be stabilized by a low-temperature (300 °C) deposited amorphous silicon nitride (a-Si:NX:H) capping layer.