Monolayer functionalization of silicon and metal oxide surfaces with boron- and nitrogen-containing precursors
Date
2024
Authors
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Publisher
University of Delaware
Abstract
As the dimensions of electronic device components shrink, there is a growing need for innovative methods and chemical modification strategies to fabricate nanometer-sized features. The work outlined in this dissertation focuses on two main strategies: the ultra-shallow monolayer doping, and area selective deposition. These strategies necessitate a detailed understanding of the interactions between different precursors and substrates, as well as the development of innovative techniques for governing and manipulating these interactions. ☐ In the following chapters, a novel chemical method for the monolayer functionalization of silicon surfaces with boron- and nitrogen-containing precursors is discussed and proposed as a pathway for ultra-shallow monolayer doping. ☐ Secondly, the monolayer functionalization of metal-oxide surfaces with an organic precursor with unique spectroscopic labels was investigated in order to understand the attachment chemistry of these materials and to develop spectroscopic labels for surface characterization. ☐ And lastly, the use of an organic molecule with unique spectroscopic labels is proposed as an effective resist to block the growth of materials in area selective deposition. ☐ The goals for the research contained in this dissertation are: • 1) Modify the surface of the semiconductor to form direct dopant (B, N)-Si bonds and control the concentration of the dopant. • 2) Explore and control the attachment of the boron-containing precursor that contains unique spectroscopic labels (F, B) with the metal-oxide surfaces. • 3) Modify the chemical reactivity of the surfaces with respect to a metal-organic precursor to inhibit or promote the deposition of TiO2 films. ☐ To achieve these goals, a combination of spectroscopic, microscopic and computational investigations was performed to study the surface chemical modifications processes. X-ray photoelectron spectroscopy (XPS), Fourier-transform infrared spectroscopy (FTIR), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and solid-state nuclear magnetic resonance spectroscopy (ss-NMR) were used to elucidate the chemical environment and to determine the binding modes of the attached compounds on the surfaces. Atomic force microscopy (AFM) was utilized to evaluate the surface morphological changes after the surface chemical modifications. Also density functional theory (DFT) calculations were utilized to supplement the analysis, interpret the results of spectroscopic measurements and to interrogate surface stability of possible surface species.
Description
Keywords
Area selective atomic layer deposition, Monolayer doping, Monolayer functionalization, Spectroscopic labels