Analysis of Diffusion at Buried Interfaces Following Area-Selective Atomic Layer Deposition For Dopant-Containing Small Molecule Inhibitors
| Author(s) | Robert Norden | |
| Date Accessioned | 2025-07-29T19:53:38Z | |
| Date Available | 2025-07-29T19:53:38Z | |
| Publication Date | 2025-05 | |
| Abstract | With further scaling of transistors to the sub-5 nm regime, photolithography is becoming less feasible in favor of bottom-up methods such as area-selective atomic layer deposition (AS-ALD). This thesis reports on the investigation of 4- fluorophenylboronic acid (FPBA) as a small molecule inhibitor (SMI) for selective doping at buried interfaces. Titania thin films were deposited on silicon substrates functionalized with FPBA and subsequently subjected to a variety of thermal treatments including both vacuum tube furnaces and rapid thermal annealing (RTA). Characterization methods, such as XPS, AFM, SEM, ellipsometry and ToF-SIMS were employed to assess surface integrity, dopant preservation and depth profiles. Diffusion was modeled using simple one-dimensional Fickian diffusion with an Arrhenius-type temperature-dependent diffusion coefficient. Through the experiments, it was found that boron preferentially diffused into the titania as opposed to the silicon, with fitted Gaussian profiles showing a finite amount of broadening for both annealing processes. However, for multiple experiments, intensive thermal load resulted in significant enough surface damage to compromise the quantification of some samples. Low heat RTA anneals preserved surface quality and led to controlled, albeit slow diffusion, showing the sensitivity of the process. This work presents a proof-of-concept for the incorporation of area-selective surface chemistry with monolayer doping techniques and reveals the tradeoffs involved in process tuning. | |
| Advisor | enter | |
| Program | enter | |
| URL | https://udspace.udel.edu/handle/19716/36413 | |
| Language | en_US | |
| Publisher | University of Delaware | |
| Title | Analysis of Diffusion at Buried Interfaces Following Area-Selective Atomic Layer Deposition For Dopant-Containing Small Molecule Inhibitors | |
| Type | Thesis |
Files
Original bundle
1 - 1 of 1
No Thumbnail Available
- Name:
- Norden, Robert Senior Thesis (1).pdf
- Size:
- 2.55 MB
- Format:
- Adobe Portable Document Format
License bundle
1 - 1 of 1
No Thumbnail Available
- Name:
- license.txt
- Size:
- 2.22 KB
- Format:
- Item-specific license agreed upon to submission
- Description:
